Return: An Epic Journey

Overview

Inspired by the African masks at the Museum Rietberg in Zurich, the Swiss artist Lukas Stucky designed a mask and asked the Congolese artist Rita Mukebo to give it the status of an artwork. In a short film produced by the Centre d’Art Waza Lubumbashi, Mukebo tests the meaning of the mask by visiting the Tshokwe community, the director of an art museum, a university professor and others.

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